Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond

MLA

Wang. Investigation On Sige Selective Epitaxy for Source and Drain Engineering In 22 Nm Cmos Technology Node and Beyond. Springer Singapore, 2019.

APA

Wang, W. (2019). Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond. Springer Singapore.

Chicago

Wang Investigation On Sige Selective Epitaxy for Source and Drain Engineering In 22 Nm CMOS Technology Node and Beyond. : Springer Singapore, 2019.