Plasma Etching Processes for Interconnect Realization in VLSI

Full text!
Type:
e-book
Titel:
Plasma Etching Processes for Interconnect Realization in VLSI
Auteur:
Posseme, Nicolas; Chevolleau, Thierry; Maxime, Darnon; Thibaut, David
Taal:
Engels
Uitgever:
Elsevier 2015
ISBN:
1-78548-015-4
0-08-100590-3
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http://bibtest.howest.be/catalog/ebk03:2670000000609569