Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond

Type:: e-book
Titel:: Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond
Auteur:: Wang
Taal:: Engels
Uitgever:: Springer Singapore 2019
ISBN:: 981-15-0045-2
981-15-0046-0
Permalink:: http://bibtest.howest.be/catalog/ebk03:4100000009451877